General Info|ISPlasma2022/IC-PLANTS2022

Invited Speakers

Invited Speakers (Nanomaterials)


Wipakorn Jevasuwan (National Institute for Materials Science (NIMS), JAPAN)
"Silicon-Based Nanostructure Formation and Device Applications for Photovoltaic Cells and Field-Effect Transistors"

Achim von Keudell (Ruhr-University Bochum, GERMANY)
"Transport from Target to Substrate in High Power Impulse Magnetron Sputtering Plasmas"

Haruki Kiyama (Kyushu University, JAPAN)
"High-Fidelity Readout of Semiconductor Spin Qubits for Large-Scale Quantum Computers"

Masashi Kurosawa (Nagoya University, JAPAN)
"Potential of Silicon-Germanium-Tin Thin Films for Future Thermoelectric Device Applications"

Katsuaki Sugawara (Tohoku University, JAPAN)
“High-Resolution ARPES Studies of Atomic-Layer Transition-Metal Dichalcogenides”

Motoyuki Murashima (Tohoku University, JAPAN)
“New Challenge for Reduction in Friction of Diamond-like Carbon Coatings using in situ Irradiation of Dielectric Barrier Discharge onto DLC Surface”

R. Mohan Sankaran (University of Illinois, U.S.A)
"On Boron-Doped Diamond and the Observation of Intervalence Plasmons"

Takayuki Tokoroyama(Nagoya University, JAPAN)
"The Effect of Graphite Domain Direction on the Friction Coefficient of Diamond-Like Carbon Measured via Polarized Raman Analysis"

Tetsuhide Shimizu (Tokyo Metoropolitan University, JAPAN)
"Film Growth-Based Process Design of HiPIMS Pulse Parameters"

Tetsuya Yamamoto (Kochi University of Technology, JAPAN)
“Surface Modification of 10-nm Thick ZnO Films as Interface Layers to Tailor the Properties of Al-doped ZnO Films and Control of Surface and Interface Roughness to Achieve High Carrier Transport Ultra-Thin W-doped In2O3 Films”

Contact us

ISPlasma2023 / IC-PLANTS2023 Secretariat
Inter Group Corp.
Orchid Building 8F, 2-38-2, Meieki, Nakamura-ku, Nagoya, 450-0002 JAPAN

Secretariat:Inter Group Corp. Phone:+81-52-581-3241 Fax:+81-52-581-5585
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