Invited Speakers (Plasma Science & Technologies)

Plasma Science & Technologies

Nobuyuki Kuboi (Sony Semiconductor Solutions Corporation, Japan)
"TBA"

Dae Hoon Lee (Korea Institute of Machinery and Materials, University of Science and Technology, South Korea)
"Plasma Driven Artificial Growth of Graphitic Structure in Atmospheric Environment"

Atsushi Komuro (National Institute of Advanced Industrial Science and Technology (AIST), Japan)
"Data-Driven Prediction of Radical Production in Streamer Discharges: A Comprehensive Simulation and Correlation Analysis"

Vasco Guerra (IPFN, Institute for Plasmas and Nuclear Fusion, Portugal)
"Insight into Heterogeneous Molecule Formation in Low-Pressure Plasmas"

Shih Nan Hsiao (Nagoya University, Japan)
"Cryogenic Atomic-Layer Processes Using Synergetic Reaction between HF and Plasma"

Hai-Xing Wang (Beihang University, China)
"TBA"

Timo Grans (Dublin City University, Ireland)
"TBA"

Selma Mededovic Thagard (Clarkson University, USA)
"Mechanistic Pathways and Reactor Design for Plasma-Assisted Mineralization of PFAS and Halogenated Pollutants"

Li-Chun Chang (Ming Chi University of Technology, Taiwan)
"TBA"