
Shugo Nitta (Mie University, Japan)
"TBA"
Hideo Aida (Nagaoka University of Technology, Japan)
"TBA"
Masashi Kato (Nagoya Institute of Technology, Japan)
"Defect Engineering in SiC: How to Keep Power Device Performance and Reliability"
Hisashi Murakami (Tokyo University of Agriculture and Technology, Japan)
"TBA”
Takahiro Kawamura (Mie University, Japan)
"First-Principles Study of the Electronic Structure of Ga2O3: Effects of Lattice Strain and Point Defects"
Tomohiro Yamaguchi (Kogakuin University, Japan)
"TBA"
Juan Paolo Soria Bermundo (Nara Institute of Science and Technology, Japan)
"Plasma-Driven Strategies for Next-Generation Sustainable Oxide Electronics"
Takayoshi Oshima (National Institute for Materials Science (NIMS), Japan)
"Crystallographic Anisotropic Etching of β-Ga2O3."
Makoto Miyoshi (Nagoya Institute of Technology, Japan)
"Structual and Energy-Band Engineering of Quaternary AlGaInN Alloys and Their Application to Heterostructure Electronic Devices"
ISPlasma2026 / IC-PLANTS2026 Secretariat
Inter Group Corp.
Orchid Building 8F, 2-38-2, Meieki, Nakamura-ku, Nagoya, 450-0002 JAPAN
Secretariat:Inter Group Corp. Phone:+81-52-581-3241 Fax:+81-52-581-5585 E-mail:isplasma2026@intergroup.co.jp
©ISPlasma 2026/IC-PLANTS2026. All Rights Reserved.