| |
 |
MEXT (Ministry of Education, Culture, Sports, Science and Technology) Knowledge Cluster Initiative (The Second Stage)
～ Tokai Region Nanotechnology Manufacturing Cluster ～ |
 |
| |
First International Symposium on |
| Advanced Plasma Science and its Applications |
|
|
| |
March 8-11, 2009
IB Building, Nagoya University, Nagoya, Japan
Organizing Committee Chairperson : Masaru Hori
Vice Director, Plasma Nanotechnology Research Center, Nagoya University |
|
|
|
|
Sponsored by
Co-sponsored by
Supported by
|
Aichi Science & Technology Foundation
Aichi Prefecture, Nagoya City, Gifu Prefecture ,Nagoya University, Nagoya institute of Technology, Meijo University, Chubu University
The Japan Society of Applied Physics Division of Plasma Electronics, Mie Prefecture, Gifu University, Toyohashi University of Technology, Toyota Technological Institute, Mie University, Japan Fine Ceramics Center, National Institute for Fusion Science, Chubu Bureau of Economy Trade and Industry (METI), Chubu Economic Federation, Nagoya Chamber of Commerce & Industry, Gifu Industries’ Association, Nagoya Industrial Science Research Institute, Nagoya City Association for Industrial Technology, Nagoya Urban Industries Promotion Corporation, Gifu Research & Development Foundation, Tokai Monodukuri Council, Aichi Industrial Research Association, Nagoya University Supportive Organization, NIT‘s Research Cooperation Association, The Japan Society of Applied Physics Tokai Chapter, The Japan Society of Plasma Science and Nuclear Fusion Research, Japan Society of Electromagnetic Wave Energy Applications(JEMEA), The Forum for Atomic and Molecular Data and Their Applications |
|
| The ISPlasma2009 will be held as part of the International Program of the Second Stage Knowledge Cluster Project (Tokai Region Nanotechnology Manufacturing Cluster) to establish an Advanced Plasma Nanotechnology Science Research Foundation in the Tokai region. The symposium is focused on at advanced plasma science and technology and its applications. Fields of focus within this symposium include plasma diagnostics/monitoring, sputtering, etching, deposition, surface modification and simulation. In addition, the conference will include plasma applications such as processing of Si or group III nitrides for nano-size semiconductors or similar nano-materials. During this symposium, the effective technological collaboration between industry-academia-government will also be discussed with the aim of establishing in the future an Advanced Plasma Science and Technology Center in the region that will collaborate with world-wide research institutes. |
Tentative Speakers:
Outline of Knowledge Cluster Initiative
Osamu Takenaka, ASTF, Japan
Masaru Hori, Nagoya University, Japan
Osamu Takai, Nagoya University, Japan
Takashi Egawa, Nagoya Institute of Technology, Japan
Yoshimi Watanabe, Nagoya Institute of Technology, Japan
Plasma Science
Jeon G. Han, Sungkyunkwan University, Korea
Uwe Czarnetzki, Ruhr-Universität Bochum, Germany
Matthew Goeckner, University of Texas at Dallas , U.S.A.
Jindrich Musil, University of West Bohemia, Czech Republic
Gilles Cunge, CEA Grenoble, France
Shigetoshi Hosaka, Tokyo Electron Limited, Japan
Tamio Hara, Toyota Technological Institute, Japan
Mineo Hiramatsu, Meijo University, Japan
Masaharu Shiratani, Kyushu University, Japan
Yuichi Setsuhara, Osaka University, Japan
Hirotaka Toyoda, Nagoya University, Japan
Akihiro Wakahara, Toyohashi University of Technology, Japan
Keiji Nakamura, Chubu University, Japan
Noritsugu Umehara, Nagoya University, Japan
|
|
Applications for Nitride Semiconductors
Bruno Daudin, CEA Grenoble, France
Yasushi Nanishi, Ritsumeikan University, Japan
Akihiko Yoshikawa, Chiba University, Japan
Jean Yves Duboz, CNRS-CRHEA, France
Katsumi Kishino, Sophia University, Japan
Hiroshi Amano, Meijo University, Japan
Technology Transfer (with interpretation)
Jean-Charles Guibert, MINATEC, France
Charles D. Dilks, Philadelphia Science Center, U.S.A
Michiyuki Kume, PLACIA, Japan
Panel Discussion (with interpretation)
Moderator
Osamu Takenaka, ASTF, Japan
Panelists
Charles D. Dilks, Philadelphia Science Center, U.S.A
Jean-Charles Guibert, MINATEC, France
Jeon G. Han, Sungkyunkwan University, Korea
Michiyuki Kume, PLACIA, Japan
Kou Matsumoto, TN EMC Ltd., Japan
Masaru Hori, Nagoya University, Japan |
|
Registration Fee: Free
Banquet Fee (on March 9th): General, JPY 5,000, Student, JPY 2,000 |
|
|
|
