ISPlasma 2009 MEXT (Ministry of Education, Culture, Sports, Science and Technology) Knowledge Cluster Initiative (The Second Stage)
~ Tokai Region Nanotechnology Manufacturing Cluster ~
ISPlasma 2009
  First International Symposium on
Advanced Plasma Science and its Applications
March 8-11, 2009
IB Building, Nagoya University, Nagoya, Japan

Organizing Committee Chairperson : Masaru Hori
Vice Director, Plasma Nanotechnology Research Center, Nagoya University

Symposium Scope

The ISPlasma2009 will be held as part of the International Program of the Second Stage Knowledge Cluster Project (Tokai Region Nanotechnology Manufacturing Cluster) to establish an Advanced Plasma Nanotechnology Science Research Foundation in the Tokai region. The symposium is focused on at advanced plasma science and technology and its applications. Fields of focus within this symposium include plasma diagnostics/monitoring, sputtering, etching, deposition, surface modification and simulation. In addition, the conference will include plasma applications such as processing of Si or group III nitrides for nano-size semiconductors or similar nano-materials. During this symposium, the effective technological collaboration between industry-academia-government will also be discussed with the aim of establishing in the future an Advanced Plasma Science and Technology Center in the region that will collaborate with world-wide research institutes.

Secretariat:c/o Aichi Science & Technology Foundation
Phone:+81-52-231-1656 Fax:+81-52-231-1640 E-mail:cluster2008@astf.or.jp URL:http://www.isplasma.jp/