ISPlasma 2011 MEXT (Ministry of Education, Culture, Sports, Science and Technology)
Regional Innovation Cluster Program (Global Type)
〜 Tokai Region Nanotechnology Manufacturing Cluster 〜
3rd International Symposium on Advanced Plasma Science
and its Applications for Nitrides and Nanomaterials
ISPlasma 2011
March 6-9, 2011
Nagoya Institute of Technology, Nagoya, Japan

Organizing Committee
Chairperson: Masaru Hori, Plasma Nanotechnology Research Center, Nagoya University
Vice-Chairperson: Hideki Masuda, Nagoya Institute of Technology
Hiroshi Amano, Nagoya University
Keiji Nakamura, Chubu University
ISPlasma2011 Second Circular
ISPlasma2011 Poster
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Symposium Scope

ISPlasma2011 is specialized international symposium where world-leading researchers can gather in the Tokai region to discuss not only advanced plasma science, its application for nitrides and nanomaterials, but also new systems for industrial technological transfers. By holding this symposium, where the latest research can be presented and discussed, we aim at two goals. First, we aim to establish an advanced plasma science and technology center in this region that can collaborate with research institutes worldwide. Our second goal is to address issues such as global warming, resources and energy problems where advanced plasma science and its application technology can serve. We aspire to contribute to the evolution of environmental, energy science and technology.

Official Language

The official language of ISPlasma2011 is English.

Related Fields

◆Plasma Science and Technology
・Advanced Plasma & Surface Diagnostics ・Simulation and Database
・Etching Process ・Deposition Process
・Solar Cells Based on Plasma Science ・Advanced Plasma Flexible Electronics

◆Nitride Semiconductors
・Crystal Growth of GaN and Related Materials ・MBE Growth of Nitrides
・Characterization ・Device Processing
・Electronic Devices ・Optical Devices

・Nanocarbon Materials ・Porous Materials
・Lithium-ion Rechargeable Battery Cells ・Surface Modification
・Surface Functionalization ・Composite
・Functionally Grade Materials ・Nanoparticles

◆Integration Technology of Plasma Science, Nitride Semiconductors and Nanomaterials

◆Industry-Academia-Government Collaboration

Plenary Speaker

    Hiroyuki Sakaki (Toyota Technological Institute, JAPAN)

Special Keynote Speaker

    John Robertson (Cambridge University, UK)

Keynote / Knowledge Cluster Speakers <Tentative>

◆Plasma Science and Technology
    J-P. Booth (CNRS, FRANCE)
    U. Czarnetzki (Ruhr-University Bochum, GERMANY)
    D. B. Graves (UC Berkeley, USA)
    M. J. Goeckner (University of Texas at Dallas, USA)
    J. G. Han (Sungkyunkwan University, KOREA)
    M. Hori (Nagoya University, JAPAN)
    M. Kondo (AIST, JAPAN)
    F. Laermer (Robert Bosch GmbH, GERMANY)
    O. Takai (Nagoya University, JAPAN)
    J. Vlcek (University of West Bohemia, CZECH REPUBLIC)
    A. Wendt (University of Wisconsin-Madison, USA)

◆Nitride Semiconductors
    H. Amano (Nagoya University, JAPAN)
    D. Alquier (Université de Tours, FRANCE)
    B. Daudin (CEA Grenoble, FRANCE)
    T. Egawa (Nagoya Institute of Technology, JAPAN)
    N. Grandjean (EPFL, SWITZERLAND)
    A. Khan (Unversity of South Carolina, USA)
    A. Krost (Otto von Guericke University Magdeburg, GERMANY)
    F. Ponce (Arizona State University, USA)
    F. Scholz (Ulm University, GERMANY)
    D. Ueda (Panasonic Corp., JAPAN)
    E. Yoon (Seoul National University, KOREA)

    S. Iijima (Meijo Univ., Japan)
    K. Mizuuchi (Osaka Municipal Technical Research Institute, JAPAN)
    M. Oda (ULVAC, Inc., JAPAN)
    H. Takikawa (Toyohashi University of Technology, JAPAN)
    Y. Watanabe (Nagoya Institute of Technology, JAPAN)
    A. Yoshino (Asahi Kasei Corp., JAPAN)
    H. Zhou (Texas A&M University, USA)

◆Industry-Academia-Government Collaboration
    T. Arimoto (JST, JAPAN)
    M. Hori (Nagoya University, JAPAN)
    W. Izumiya (Sangyo Times Inc., JAPAN)
    C. Mantel (Selantek, Inc., USA)
    W. Vandervorst (IMEC, BELGIUM)
*Simultaneous Interpretation
*Registration Fee: Free

Panel Discussion <Tentative>

Application of Advanced Plasma Technology for Nitride Semiconductors II
Succeeding to ISPlasma2010, the role of plasma science and technology for applications to nitride semiconductors such as; plasma processing for device fabrication and nitrogen radical source for crystal growth and others will be discussed.
Y. Nanishi (Ritsumeikan University, JAPAN/Seoul National University, KOREA)

D. Alquier (Universite de Tours, FRANCE)
H. Amano (Nagoya Unversity, JAPAN)
B. Daudin (CEA Grenoble, FRANCE)
H. Kano (NU Eco Engineering Co., Ltd., JAPAN)
A. Khan (Unversity of South Carolina, USA)
E. Monroy (CEA Genoble, FRANCE)
T. Yutaka (Aichi Institute of Technology, JAPAN)
D. Ueda (Panasonic Corporation, JAPAN)
A. Uedono (Tsukuba Unversity, JAPAN)

Establishment of an Advanced Plasma Science and Technology Center toward Open Innovation
After reports by specialists from various fields related to open innovation, the way towards establishing an advanced plasma science and technology center in the Tokai region through open innovation will be discussed.
N. Odake (Nagoya Institute of Technology, JAPAN)

T. Arimoto (JST, JAPAN)
M. Hori (Nagoya University, JAPAN)
W. Izumiya (SangyoTimes Inc., JAPAN)
Y. Madokoro (Aichi Prefectural Government, JAPAN)
C. Mantel (Selantek, USA) *Lecture by Dr. Mantel has been canceled.
W. Vandervorst (IMEC, BELGIUM)
*Simultaneous Interpretation
*Registration Fee: Free

Secretariat:c/o Aichi Science & Technology Foundation
Phone:+81-52-231-1656 Fax:+81-52-231-1640 E-mail:isplasma@astf.or.jp