Japanese

ISPlasma 2011 MEXT (Ministry of Education, Culture, Sports, Science and Technology)
Regional Innovation Cluster Program (Global Type)
〜 Tokai Region Nanotechnology Manufacturing Cluster 〜
KNOWLEDGE CLUSTER
3rd International Symposium on Advanced Plasma Science
and its Applications for Nitrides and Nanomaterials
ISPlasma 2011
March 6-9, 2011
Nagoya Institute of Technology, Nagoya, Japan


Organizing Committee
Chairperson: Masaru Hori, Plasma Nanotechnology Research Center, Nagoya University
Vice-Chairperson: Hideki Masuda, Nagoya Institute of Technology
Hiroshi Amano, Nagoya University
Keiji Nakamura, Chubu University
ISPlasma2011 Second Circular
ISPlasma2011 Poster
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Registration  Registration has been closed on February 28th 2011, 9pm.
Thank you for your access. Registration is available at the onsite.

Registration Fee General Student
Early Registration(before January 31, 2011)
JPY 20,000 JPY 3,000
Late Registration
(until February 28, 2011 9:00pm (Japan Time))
JPY 25,000 JPY 5,000
On-Site Registration**
JPY 30,000 JPY 7,000
**Online registration will close after March 1, 2011. Please register On-site.

March 8, 2011 Banquet Fee JPY 5,000 JPY 2,000
*Tax Included.
*Please pay your banquet fee together with your registration.
*Refunds for registration or banquet cannot be made at any reason.

For those attending only the March 9, PM Session
(Industry-Academia-Government Collaboration Lecture and Panel Discussion):
Registration Fee is FREE.
*Advanced online registration is required.


Registration


Secretariat:c/o Aichi Science & Technology Foundation
Phone:+81-52-231-1656 Fax:+81-52-231-1640 E-mail:isplasma@astf.or.jp