
Tomoki Matsuda(Osaka Univ, JAPAN.)
"Current-Assisted Low-Temperature Ag Sinter Bonding to Semiconductor Materials"
Talashi Matsumoto (TOKYO ELECTRON, JAPAN.)
"Low-Dimensional Nano-Carbon Material Synthesized by Microwave Plasma CVD for Cutting Edge Interconnects"
Wei-Chen Wen (IHP, GERMANY.)
"Three-Dimensional Self-Ordering and Alignment Control of Ge Nanodots Fabricated by Chemical Vapor Deposition"
Yusuke Nakanishi (The University of Tokyo, JAPAN)
"One-Dimensional Heterostructures: Exploring Atomic Wires of Chalcogenides within One-Dimensional Nanospaces"
Ryusei Saeki (Kyushu University, JAPAN)
"Electrocatalytic Performance for Hydrogen Evolution Reaction (HER) on Electrodeposited Ni Nanowire Array Electrodes with Ultra-High Aspect Ratio"
Young-Jun Jang (Korea Institute of Materials Science (KIMS), KOREA)
"Tensile Testing as Alternative Evaluation Method for Enhanced Adhesion of Diamond-like Carbon (DLC) Coatings"
ISPlasma2025 / IC-PLANTS2025 Secretariat
Inter Group Corp.
Orchid Building 8F, 2-38-2, Meieki, Nakamura-ku, Nagoya, 450-0002 JAPAN
Secretariat:Inter Group Corp. Phone:+81-52-581-3241 Fax:+81-52-581-5585 E-mail:isplasma2025@intergroup.co.jp
©ISPlasma 2025/IC-PLANTS2025. All Rights Reserved.