| Poster Presentations 3/9 (Mon) 12:00-14:00 |
| Mo-1 | Plasma-Enhanced Chemical Vapor Deposition of Amorphous Carbon in Atmospheric Pressure Y. Matsudaira1, H. Inui1, T. Kino1, H. Kano2, K. Takeda1, M. Sekine1, and M. Hori1 1Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Japan 2NU Eco-Engineering Co., Ltd., Japan |
| Mo-2 | High Accuracy Plasma Etching Process Employing Real Time Monitoring of Substrate Temperature H. Kuroda1, H.Yamamoto2, M. Ito3, T. Ohta3, K. Takeda2, M. Sekine2, 4, and M. Hori2, 4 1Department of Quantum, Nagoya University, Japan 2Department of Electrical Engineering and Computer Science, Nagoya University, Japan 3Department of Opto-Mechatronics, Wakayama University, Japan 4JST-CREST, Japan |
| Mo-3 | Development of High Density Nitrogen Radical Source and Behaviors of Atomic Radicals S. Chen1, H. Kano2, S. Den3, S. Takashima4, K. Takeda1, and M. Hori1 1Department of Electrical Engineering and Computer Science, Nagoya University, Japan 2NU Eco-Engineering Co., Ltd., Japan 3Katagiri Engineering Co., Ltd., Japan 4Nagoya Urban Industries Promotion Co., Japan |
| Mo-4 | Growth of Carbon Nanowalls of High Graphitization Employing PECVD W. Takeuchi1, M. Hiramatsu2, H. Kano3, Y. Tokuda4, and M. Hori1 1Department of Electrical Engineering and Computer Science, Nagoya University, Japan 2Department of Electrical Engineering, Meijo University, Japan 3Department of Electrical Engineering, Aichi Institute of Technology, Japan 4NU Eco-Engineering Co., Ltd., Japan |
| Mo-5 | Absolute Density of Hydrogen Atoms in the High Pressure VHF Capacitively Coupled Plasma for Solar Cell Devices Y. Abe1, S. Kawashima1, K. Takeda1, M. Sekine2, 3, and M. Hori1, 2, 3 1Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Japan 2Plasma Nanotechnology Research Center, Japan 3JST-CREST, Japan |
| Mo-6 | Laser Thomson Scattering Measurements of Microplasmas Y. Kawamura, Y. Harada, K. Fukuyama, M. Aramaki, and A. Kono Department of Electrical Engineering and Computer Science, Nagoya University, Japan |
| Mo-7 | Microwave Plasma Control with Use of Multi-Hollow Dielectric Plate S. Ohta, T. Sano, Y. Liang, K. Nakamura, and H. Sugai Department of Electronics & Information Engineering, Chubu University, Japan |
| Mo-8 | Diagnostics of RF Magnetron Sputtering Plasma for Synthesizing Indium-Zinc-Oxide Film |
| Mo-9 | Diagnostics of Non-Equilibrium Atmospheric Pressure Plasma for Penicillium Digitatum Disinfection S. Iseki1, T. Ohta1, M. Ito1, Y. Higashijima2, H. Kano 3, and M. Hori4 1Faculty of Systems Engineering, Wakayama University, Japan 2NU System CO., LTD., Japan 3NU EcoEngineering CO., LTD., Japan 4Department of Electrical Engineering and Computer Science, Nagoya University, Japan |
| Mo-10 | Influence of Polymer Depositon on Electron Monitoring with Frequency Shift Probes Q. Zhang, K. Nakamura, and H. Sugai Department of Electrical Engineering, Chubu University, Japan |
| Mo-11 | Basic Experiment on Microcrystalline Silicon Film Deposition by 915 MHz Microwave Plasma CVD H. Asano1, T. Ishijima2, and H. Toyoda1,2 1Department of Electrical Engineering and Computer Science, Nagoya University 2Plasma Nanotechnology Research Center, Nagoya University, Japan |
| Mo-12 | Development of High-Power and Compact Electron-Beam-Excited-Plasma (EBEP) Source R. Ichiki and T. Hara Toyota Technological Institute, Japan |
| Mo-13 | Effect of Micro-Scale Young’s Modulus on Adhesion Property of Plasma Treated Rubber Surface J.H. Kim1, H. Kousaka1, N. Umehara1, I. Nitta2, M. Shimada3 , and M. Hasegawa3 1Department of Mechanical Science and Engineering, Nagoya University, Japan 2Graduate School of Science and Technology, Niigata University, Japan 3Nipro Corporation, Research and Development Laboratory, Japan |
| Mo-14 | Nanoscale Friction and Adhesion Behaviors of Double Roughening Diamond-like Carbon Film with Various Humidity Y. Jang, H. Kousaka, and N. Umehara Advanced Materials and Manufacturing Laboratory, Department of Mechanical Science and Engineering, Nagoya University, Japan |
| Mo-15 | Aerosol Plasma (Plasma Processor for Aerosol Powder) F. Hori1, M. Hori2 1Alpha Co., Ltd., Japan 2Plasma Nanotechnology Research Center, Nagoya University, Japan |
| Mo-16 | Laser Measurement for Hydrolysis of TTIP Solution S. Ikezawa, M. Hayakawa, and S. Parajulee Department of Electrical & Electronic Engineering, Chubu University, Japan |
| Mo-17 | Adhesion of Ti (O, N) Coatings on Glass S. Parajulee, M. Hayakawa, and S. Ikezawa Department of Electrical and Electronic Engineering, Graduate School of Engineering, Chubu University,Japan |
| Mo-18 | Ca Ordering in Ca0.33CoO2 Thin Films for Thermoelectric Applications R. Huang1, T. Mizoguchi2, K. Sugiura3, H. Ohta3, K. Koumoto3, T. Hirayama1, and Y. Ikuhara1, 2 1Nanostructures Research Laboratory, Japan Fine Ceramics Center, Japan 2Institute of Engineering Innovation, the University of Tokyo, Japan 3Graduate School of Engineering, Nagoya University, Japan |
| Mo-19 | Reactive Plasma Nitriding of Al Powders in Atmospheric Plasma Spray M. Shahien, M. Yamada, T. Yasui, and M. Fukumoto Toyohashi University of Technology, Japan |
| Mo-20 | Liquid Immersion Angled Exposure Technique for 3D Photolithography T. Hosono, S. Kumagai, and M. Sasaki Toyota Technological Institute, Japan |
| Mo-21 | Micromirror Realized by Combined Surface and Bulk Micromachining using Isotropic and Anisotropic Si Etching M. Sasaki1, S. Kumagai1, and K. Hane2 1Toyota Technological Institute, Japan 2Tohoku University, Japan |
| Mo-22 | Production and Evaluation of Epoxy Composites with Carbon Nanotube T. Suzuki, S. Inoue, K. Nojima, B. Chen, H. Minoura, and Y. Ando Department of Materials Science & Engineering, Meijo University, Japan |
| Mo-23 | Purification of Single-wall Carbon Nanotubes by Fenton's Reaction T. Suzuki, S. Inoue, and Y. Ando Department of Materials Science & Engineering, Meijo University, Japan |
| Mo-24 | Fabrication of Carbon Nanostructure using Radical Injection Plasma Enhanced Chemical Vapor Deposition and Its Electrochemical Evaluation H. Watanabe1, M. Hiramatsu1, and M. Hori2 1Department of Electrical and Electronic Engineering, Meijo University, Japan 2Department of Electrical Engineering and Computer Science, Nagoya University, Japan |
| Mo-25 | Direct Growth of Carbon Nanotube Films by DC Arc Discharge Plasma H. Wang1, Z. Li2, S. Inoue1, and Y. Ando1 1Department of Materials Science & Engineering, Meijo University, Japan 2Department of Mechanics, Zhejiang University, China |
| Mo-26 | Fabrication of Bridge-shaped Carbon Nanowall on Trench Substrates Using Electron Beam Excited Plasma Enhanced CVD H. Mikuni1, W. Takeuchi1, M. Hiramatsu2, H. Kano3, Y. Tokuda4, K. Takeda1, and M. Hori1 1Department of Electrical Engineering and Computer Science, Nagoya University, Japan 2Department of Electrical and Electronic Engineering, Meijo University, Japan 3NU Eco-Engineering Co., Ltd., Japan 4Department of Electrical and Electronics Engineering, Aichi Institute of Technology, Japan |
| Mo-27 | Synthesis of Platinum Nanoparticles on Carbon Nanowalls by Employing Supercritical Carbon Dioxide |
3/10 (Tue) 12:00-14:00 |
| Tu-1 | Production of Gold Nanoparticles by Picosecond Laser Ablation in Liquids: (1) Solvents Effect on Structure and Surface Properties G. Satomi, H. Kato, and H. Yui Department of Chemistry, Faculty of Science, Tokyo University of Science, Japan |
| Tu-2 | Production of Gold Nanoparticles by Picosecond Laser Ablation in Liquids: (2) Investigation of Its Primary Process by Electron-enhanced Raman Scattering H. Kato, G. Satomi, Y. Someya, and H. Yui Department of Chemistry, Faculty of Science, Tokyo University of Science, Japan |
| Tu-3 | Surface Modification of Single-Walled Carbon Nanotubes for Electric Double-Layer Capacitor Electrodes S. Kawasaki, Y. Suzuki, T. Kawashita, and I. Mukhopadhyay Department of Materials Science & Technology, Nagoya Institute of Technology, Japan |
| Tu-4 | Sensing VOCs by using the Organic-Inorganic Nanocomposite T. Sawaki, N. Ohata, T. Inomata, Y. Funahashi, T. Ozawa, and H. Masuda Department of Applied Chemistry, Nagoya Institute of Technology, Japan |
| Tu-5 | Adsorbing and Sensing Microbes by Artificial Siderophores-Modified Au Substrates H. Tanabashi, T. Inomata, H. Eguchi, Y. Funahashi, T. Ozawa, and H. Masuda Department of Applied Chemistry, Nagoya Institute of Technology, Japan |
| Tu-6 | Dioxygen Activation by Non-Heme Diiron Complex-Modified Electrode. T. Inomata, Y. Hayashi, K. Shinozaki, Y. Funahashi, T. Ozawa, and H. Masuda Department of Applied Chemistry, Nagoya Institute of Technology, Japan |
| Tu-7 | Visible Light-Induced Catalytic Oxidation by using the Organic-Inorganic Nanocomposite Y. Nagai, N. Ohata, T. Inomata, Y. Funahashi, T. Ozawa, and H. Masuda Department of Applied Chemistry, Nagoya Institute of Technology, Japan |
| Tu-8 | Preparation and Characterization of A Square Planar Ru Complex Immobilized into Meso-porous Silica Material FSM-16 and The Improvement in Epoxidation Selectivity T. Okumura1, H. Takagi2, Y. Funahashi1, T. Ozawa1, K. Jitsukawa1, Y. Fukushima2, and H. Masuda1, 1Department of Frontier Materials, Graduate School of Engineering, Nagoya Institute of Technology, Japan 2TOYOTA, Central R&D Labs. Inc., Japan |
| Tu-9 | Triarylamine-Functionalized Ruthenium Dyes for Efficient Dye-Sensitized Solar Cells Z. Jin1, H. Masuda1, N. Yamanaka2, and M. Minami2 1Department of Applied Chemistry, Graduate School of Engineering, Nagoya Institute of Technology, Japan 2Central Technical Research Laboratory, Nippon Oil Corporation, Japan |
| Tu-10 | Crystal Growth of A-plane GaN on a Patterned (110) Si Substrate by Selective MOVPE T. Tanikawa, Y. Honda, M. Yamaguchi, and N. Sawaki Department of Electronics & Akasaki Research Center, Nagoya University, Japan |
| Tu-11 | Selective Growth of (1-101)GaN on Large Size Si Substrate with SiO2 Mask Deposited by Oblique EB Evaporation Y. Honda, T. Tanikawa, M. Yamaguchi, and N. Sawaki Department of Electronics & Akasaki Research Center, Nagoya University, Japan |
| Tu-12 | In Situ Moritoring on MOVPE Growth of Nitride Semiconductors M. Narukawa, Y. Ogawahara, H. Miyake, and K. Hiramatsu Department of Electrical and Electronic Engineering, Mie University, Japan |
| Tu-13 | Low-Pressure HVPE Growth of Thick AlN on Trench-Patterned Substrate K. Okuura, Y. Katagiri, H. Miyake, and K. Hiramatsu Department of Electrical and Electronic Engineering, Mie University, Japan |
| Tu-14 | Optical Properties of InGaN/GaN Stripe Structure Grown on (111)Si B. Kim, T. Tanikawa, Y. Honda, M. Yamaguchi, and N. Sawaki Department of Electronics & Akasaki Research Center, Nagoya University, Japan |
| Tu-15 | Etching of GaN by Plasma Chemical Vaporization Machining Y. Nakahama1, 2, N. Kanetsuki1, T. Funaki1, M. Kadono1, Y. Sano3, K. Yamamura2, K. Endo2, and Y. Mori2 1SHARP Corporation, Japan 2Research Center for Ultra-Precision Science and Technology, Graduate School of Engineering, Osaka University, Japan 3Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, Japan |
| Tu-16 | Demonstration of AlGaN-based Deep-UV LEDs on AlN Templates Y. Sakai1, Y. Zhu1, T. Egawa1, S. Sumiya2, M. Miyoshi2, and M. Tanaka2 1Research Center for Nano-Device and System, Nagoya Institute of Technology, Japan 2NGK Insulators, LTD., Japan |
| Tu-17 | Gate Controllable Light Emitting Device Based-on Rare Earth Ion Doped AlGaN/GaN HEMT T. Hata1, H. Okada1, Y. Furukawa1, A. Wakahara1, Y. Takagi2, S. Sato3, and T. Ohshima3 1Department of Electrical & Electronic Engineering, Toyohashi University of Technology, Japan 2Hamamatsu Photonics K.K., Japan 3Japan Atomic Energy Agency, Japan |
| Tu-18 | Plasma Oxidized Aluminum at the Schottky of AlGaN/GaN HEMTs to Suppress Current Collapse and Gate Leakage S.L. Selvaraj and T. Egawa Research Center for Nano-Device and System, Nagoya Institute of Technology, Japan |
| Tu-19 | High-Performance Photodetector Based on AlGaN/GaN Hetero-Field-Effect Transistors with P-GaN Gate M. Iwaya, S. Kamiyama, H. Amano, and I. Akasaki Department of Materials Science & Engineering, Meijo University, Japan |
| Tu-20 | Fabrication of Biomedical Ti/βTCP Composite by Spark Plasma Sintering Method |