General Info|ISPlasma2022/IC-PLANTS2022

Invited Speakers

Invited Speakers (Nanomaterials)

Nanomaterials

Hiroki Hibino (Kwansei Gakuin University, Japan)
"Controlled Growth of Heterostructures of Graphene and Hexagonal Boron Nitride"

Yuki K. Wakabayashi (NTT Basic Research Laboratories, Japan)
"Machine-Learning-Assisted Molecular Beam Epitaxy for Growth of High-Quality Magnetic Oxides"

Yuhei Miyauchi (Kyoto University, Japan)
"Exciton Properties in One- and Two-Dimensional Semiconducting Nanomaterials and their Applications"

Kazuyoshi Ueno (Shibaura Institute of Technology, Japan)
"Advances in Graphene Processes for Metallization and High Frequency Devices"

Junho Choi (The University of Tokyo, Japan)
"Development of Amorphous Carbon Film Based Highly Durable Triboelectric Nanogenerator"

Katsuhiro Tomioka (Hokkaido University, Japan)
"Integration of III-V Nanowires on Si and their Device Applications"

Feng Liang (Kunming University of Science and Technology, China)
"Preparation of Nanomaterials as Electrocatalysts by DC Arc Discharge"

Hiroki Ago (Kyushu University, Japan)
"2.5-Dimensional Materials Science: Controlled Growth, Integration, and Applications of Graphene and h-BN"

Dang Feng (Shandong University, China)
"Cathode Catalytic Capability of Two-dimensional Materials with Stacking-layered Crystal Structure in Li-O2 Batteries"

Takashi Kita (Kobe University, Japan)
"Control of Quantum-Dot Growth for Novel Solar Cells"

Hiroyuki Miyazoe (IBM Corporation, U.S.A.)
"Future of Computing and Plasma Processings"

Hari Nadendla (Brunel University, U.K)
"Nano Materials for Advanced Light-Weight Alloy Metals for Next Generation Automobiles"

Daisuke Takeuchi (National Institute of Advanced Industrial Science and Technology (AIST), Japan)
"Diamond Pin Diode-Type Electron Emitters for Power Swtiches"

Hirofumi Tanaka (Kyushu Institute of Technology, Japan)
"In-Materio Computing Devices Consisted of Random Network Nanoparticles for Autonomous Robot Operation Systems"

Takeaki Yajima (Kyushu University, Japan)
"Next-Generation Switching Devices Based on Metal-Insulator Transitions"

Yasunori Tanaka (Kanazawa University, Japan)
"Numerical Simulation on Decaying Arc Plasmas in Polyatomic Molecular Gas Flow for Fundamental Study on Interrupting Electric Current"

Tsuyoshi Hasegawa (Waseda University, Japan)
"Application of the Atomic Switch Technology to Neuromorphic Computing"

Tomoyuki Murakami (Seikei University, Japan)
"Graph-Theoretical Analysis of Chemical Network Activated by Low-Temperature Plasma"

Satoshi Hamaguchi (Osaka University, Japan)
"Machine-Learning Based Analyses of Plasma Processing"

Takeshi Ohmori (Hitachi, Ltd., Japan)
"Applying Machine Learning Methods to Etching Process Development"

Contact us

ISPlasma2022 / IC-PLANTS2022 Secretariat
Inter Group Corp.
Orchid Building 8F, 2-38-2, Meieki, Nakamura-ku, Nagoya, 450-0002 JAPAN

Secretariat:Inter Group Corp. Phone:+81-52-581-3241 Fax:+81-52-581-5585 E-mail:isplasma2022@intergroup.co.jp
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