General Info|ISPlasma2019/IC-PLANTS2019

Invited Speakers

Plenary Speaker

M. Kawai (Institute for Molecular Science, Japan)
"NOVEL FEATURE OF MOLECULES Induced by the Interaction with Substrate"

Keynote Speakers

G. S. Hwang (University of Texas, U.S.A.)
"Accelerating Materials Discovery and Process Optimization via High-Performance Computing"

D. Mariotti (Ulster University, U.K.)
“Atmospheric Pressure Plasmas for Next Generation Energy Materials”

H. Metelmann (University Medicine Greifswald, Germany)
“Plasma and Cancer – On the Way to Evidence Based Medicine”

Prof. Riccardo d’Agostino Memorial Session Speakers

P. Favia (University of Bari, Italy)
"Remembering the Contribution of Prof. Riccardo D’Agostino to Plasma Science and Technology"

M. Hori (Nagoya University, Japan)
"A Door of Plasma Chemistry toward Bio Innovations Opened by Professor Riccard D‘Agostino"

J. Pouvesle (CNRS/Universite d'Orleans, France)
Material processing by atmospheric pressure plasma jets In memory of Riccardo D’Agostino

T. Shirafuji (Osaka City University, Japan)

T. C. Wei (Chung Yuan Christian University, Taiwan)

Invited Speakers

Plasma Science & Technologies

Y.H. Im (Chonbuk National University, Korea)
"Simulation of Plasma-surface Interactions in Semiconductor Plasma Process"

A. Komuro (Tohoku University, Japan)
“Numerical Simulation for Chemical Reactions in Atomospheric-pressure Streamer Discharge in Air”

M. Shigeta (Osaka University, Japan)
"To See Thermofluid Dynamics in Arc Welding Processes"

Y. H. Song (Korea Institute of Machinery and Materials, Korea)
“Plasma Technologies for Reducing Emissions from Diesel Engine”

K. Takeda (Meijo University, Japan)
"Systematic Diagnostics of AC Excited Atmospheric Pressure Plasma Jet for Bio-medical Applications"

Nitride Semiconductors

H. Aida(Nagaoka University of Technology, Japan)
“Challenges toward Prospective Precise Polishing Techniques by Fusing Environmental Controlling and Plasma Technology”

D. Biswas (Nagoya Institute of Technology, Japan)
"Improvement in Breakdown Voltage of Fully-vertical GaN p-n Diode on Si"

S. F. Chichibu (Tohoku University, Japan)
“Recent Progress in Acidic Ammonothermal Growth of GaN Crystals”

J. Kuzmik (Institute of Electrical Eng., Slovak Academy of Sciences, Slovakia)
“GaN-Based Normally-off HEMTs for Switching and Logic Applications”

M. Jo (RIKEN, Japan)
"Structural and Optical Investigation of (11-22) AlGaN on m-plane Sapphire"

A. Kaminska (Institute of Physics, Polish Academy of Science, Poland)
“High Pressure Studies of Recombination Mechanisms in Nitride Semiconductor Structures”

S. Kamiyama (Meijo University, Japan)

Y. Liu (San Yat-sen University, China)
" High-mobility E-mode Recessed Gate GaN MISFETs with High-quality MIS Interface Fabricated by Selective Area Growth"

T. Narita (Toyota Central R&D Labs., Inc., Japan)
"Overview of Carrier Compensation in n-type and p-type GaN Layers Grown by Metalorganic Vapor Phase Epitaxy"

A. Nishikawa (ALLOS Semiconductors, GmbH, Germany)
"High Crystal Quality GaN-on-Si to Achieve Excellent Isolation and Dynamic Performance without Carbon Doping"

Y. Sano (Osaka University, Japan)
"Development of Array-type Plasma Generator for High-throughput Numerically Controlled Processes"

T. Shibata (DOWA Electronics Materials Co., Ltd., Japan)
"Progress of Deep UV Leds and their Technical Roadmap."

Q. Sun (Suzhou Institute of Nano-tech and Nano-bionics (SINANO), China)
"GaN-on-Si Optoelectronics and Power Electronics"


T. Kato (Tohoku University, Japan)
"Nanoscale Plasma Processing for Synthesis and Applications of Graphene Nanoribbon"

K. Morita (National Institute for Materials Science (NIMS), Japan)
"Fabrication of High Strength Transparent Ceramics through Spark-plasma-sintering (SPS) Method"

T. Moriya (Tokyo Electron Limited., Japan)
"Data Analytics Approach for Optimizing Plasma Process and Equipment Condition"

Y. Nakamura (Osaka University, Japan)
“Design of Semiconductor Nanoarchitecture for Thermoelectric Property Control”

T. Otsuji (Tohoku University, Japan)
“Terahertz Light Emission and Lasing in Current-driven Graphene-based 2D Nano-Structures”

Y. Pei (San Yat-sen University, China)
“In2O3 Tft Based Ph Sensor with Sensitivity Over than Nernst Limit”

M. Sakuraba (Tohoku University, Japan)
“Epitaxy and In-Situ Doping in Low-Energy Plasma CVD Processing for Group-IV Semiconductor Nanoelectronics”

T. Sasaki (National Institute of Advanced Industrial Science and Technology (AIST), Japan)
"Production of Large Area Graphene using Plasma Chemical Vapor Deposition, and the Application as Transparent Conductive Films"

M. R. Vasquez, (University of the Philippines, Phillipines)
“Development of Low-energy Ion Sources for Thin Film Deposition Applications”

Bio Applications

E. H. Choi (Kwangwoon University, Korea)

G. Fridman (Drexel University, U.S.A.)
"DBD and GlidArcs in Plasma Agriculture and Food Safety"

J. Ikeda (Osaka University, Japan)
"Therapeutic Strategy using Non-thermal Plasma for Cancers Targeting Cancer-initiating Cells"

M. Keider (The George Washington University, U.S.A.)
“Adaptive Plasmas for Plasma Medicine”

H. Lee (KAIST, Korea)
"Biomedical Microsystems for Neural Interface"

E. Martines (Consorzio RFX, Italy)
"Interaction of Cold Atmospheric Plasmas with Cell Membranes"

G. D. Masi (Consorzio RFX, Italy)
"The Effect of an Athospheric Plasma Source on Blood Coagulation"

J. Pouvesle (CNRS, France)
"Plasma/Target Interactions in Non-thermal Atmospheric Plasma Biomedical Applications: A Challenge and Key Issue"

E. Szili(University of South Australia, Australia)
“On the Role of Plasma in Biofilm Formation”

J. S. Wu (National Chiao Tung University, Taiwan)
"Human Blood Coagulation using Atmospheric-pressure Argon Plasma Jet"

Y. Yamanishi (Kyushu University, Japan)
"Emerging Functions of Plasma-induced Bubbles"

Contact us

ISPlasma2019 / IC-PLANTS2019 Secretariat
Inter Group Corp.
Orchid Building 8F, 2-38-2, Meieki, Nakamura-ku, Nagoya, 450-0002 JAPAN

  • +81-52-581-3241
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