A-4 Plasma Applications
Session Organizer
Representative
Kenji ISHIKAWA, Nagoya Univ.Co-organizers
Koji ERIGUCHI, Kyoto Univ.Kenji MAEDA, Hitachi,Ltd.
Masanaga FUKASAWA, Sony Corporation
Taisei MOTOMURA, National Institute of Advanced Industrial Science and Technology
Invited Speakers
Toshiaki KATO, Tohoku Univ.Kazuya YAMAMURA, Osaka Univ.
Alok RANJAN, TEL Technology Center
Topics
・Plasma Etching・Surface Treatment
・Other application