ISPlasma 2012

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Symposium Scope

ISPlasma is specialized international symposium where more than 1,000 world-leading scientists and engineers can get together in the Tokai region (central Japan) to discuss latest researches in the fields of advanced plasma science, its application for processing and manufacturing of nitrides and nanomaterials, as well as new systems for industrial technological transfers. This symposium will address issues such as global warming, resources and energy problems where advanced plasma science and its application technology can serve. We aspire to contribute to the evolution of environmental science and green technology. By holding this symposium series, we aim to establish an advanced plasma science and technology center in this region that can collaborate with research institutes worldwide.

Official Language

The official language of ISPlasma2012 is English.

Related Fields

PLASMA　SCIENCE

・Plasma Source	・Advanced Plasma Measuring Technology
・Modeling and Simulation	・Etching Process
・Thin Film Deposition Process	・Flexible Electronics
・Plasma Biology and Medicine	・Plasma for Clean Energy
・Plasma for Nanotechnology

NITRIDE　SEMICONDUCTORS

・Crystal Growth of GaN and Related Materials	・MBE Groｗth of Nitrides
・Characterization	・Device Processing
・Optical Devices	・Electronic Devices

NANOMATERIALS

・Nanocarbon Materials	・Porous Materials
・Surface Modification/ Surface Functionalization	・Composite/ Functionally Grade Materials
・Nanoparticle/Nanowire/Nanorod	・Nanomaterials for Energy Applications

PLENARY SPEAKER

Atsuo Iiyoshi (Chubu University, JAPAN)

KEYNOTE SPEAKERS

NITRIDE SEMICONDUCTORS
Y. Nanishi (Ritsumeikan University, JAPAN/Seoul National University, KOREA)
T. Palacios (Massachusetts Institute of Technology, USA)

NANOMATERIALS
P. Kamat (University of Notre Dame, USA)

PLASMA ASSISTED GROWTH　Focused Session　
J. Speck (University of California Santa Barbara, USA)

ADVANCED CARBON MATERIALS　Focused Session　
M. Meyyappan (NASA Ames Research Center, USA)

ADVANCED NITRIDE DEVICES　Focused Session　
B. Daudin (CEA-Grenoble, FRANCE)

GREEN INNOVATION　Focused Session　
R. Nemanich (Arizona State University, USA)

INDUSTRY-ACADEMIA-GOVERNMENT　COLLABORATION　Focused Session　Simultaneous Interpretation　
    *Registration Fee:Free
    T. Degawa (TECHNO INTEGRATION Co. Ltd, JAPAN)
    W. Izumiya (Sangyo Times, Inc., JAPAN)
    T. Koljonen (VTT Technical Research Centre of Finland, FINLAND)
    S. Ohmori (YRP International Alliance Institute, JAPAN)

E. Tai (Industrial Technology Research Institute, TAIWAN)

INVITED SPEAKERS

PLASMA SCIENCE
    R. P. Brinkmann (Ruhr-University Bochum, GERMANY)
    R. Bruce (IBM T. J. Watson Research Center, USA)
    P. Favia (University of Bari, ITALY)
    M. Goeckner (University of Texas at Dallas, USA)
    A. Ito (National Institute for Fusion Science, JAPAN)
    T. Kaneko (Tohoku University, JAPAN)
    H. Shea (EPFL, SWITZERLAND)

NITRIDE SEMICONDUCTORS
    K. Chen (The Hong Kong University of Science and Technology, CHINA)
    T. Hashimoto (SixPoint Materials, Inc., USA)
    K. Kishino (Sophia University, JAPAN)
    J. Suda (Kyoto University, JAPAN)

NANOMATERIALS
    Y. Awano (Keio University, JAPAN)
    H. Yamaguchi Greenslet (University of Florida, USA)
    S. Inagaki (Toyota Central R&D Labs., Inc., JAPAN)
    X. Li (Peking University, CHINA)
    P. Mayrhofer (Montanuniversitaet Leoben, AUSTRIA)
    H. Nishihara (Tohoku University, JAPAN)

ADVANCED NITRIDE DEVICES　Focused Session　
    T. Hashizume (Hokkaido University, JAPAN)
    Y. Saito (Toshiba Corporation Semiconductor & Storage Products Company, JAPAN)

ADVANCED CARBON MATERIALS　Focused Session　
    M. Hasegawa (AIST, JAPAN)

GREEN INNOVATION　Focused Session　
    T. Nozaki (Tokyo Institute of Technology, JAPAN)
    V. Svrcek (AIST, JAPAN)
    A. Yoshikawa (Chiba University, JAPAN)

TUTORIAL

Tutorial course includes fundamentals as well as current topics that would attract researchers in the each fields.
Assumed participants are not just the graduate students and beginners in the company, but also specialists in other fields and entrepreneurs of the start-ups.

PLASMA SCIENCE
    U. Czarnetzki (Ruhr-University Bochum, GERMANY)
    A. Kono (Nagoya University, JAPAN)

NITRIDE SEMICONDUCTORS
    H. Amano (Nagoya University, JAPAN)
    A. Khan (University of South Carolina, USA)

NANOMATERIALS
    J. G. Han (Sungkyunkwan University, KOREA)
    M. Hiramatsu (Meijo University, JAPAN)

PANEL DISCUSSION

	Establishment of Global Research Hub toward Sustainable Development　 Simultaneous Interpretation *Registration Fee:Free
	<Moderator> N. Odake (Nagoya Institute of Technology, JAPAN) <Panelist> T. Degawa (Techno Integration Co. Ltd, JAPAN) M. Hori (Nagoya University, JAPAN) W. Izumiya (Sangyo Times, Inc., JAPAN) T. Koljonen (VTT Technical Research Centre of Finland, FINLAND) S. Ohmori (YRP International Alliance Institute, JAPAN) E. Tai (Industrial Technology Research Institute, TAIWAN)

Application of Advanced Plasma Technology for Nitride Semiconductors III　Focused Session　
-Importance and problem of plasma processing in nitride semiconductor devices-
<Moderator> H. Amano (Nagoya University, JAPAN)
<Panelist>
T. Hashizume (Hokkaido University, JAPAN)
T. Kachi (Toyota Central R&D Labs., Inc., JAPAN)
A. Khan (University of South Carolina, USA)
S. L. Selvaraj (Nagoya Institute of Technology, JAPAN)
Y. Nanishi (Ritsumeikan Univ., JAPAN/Seoul National Univ., KOREA)
Y. Saito (Toshiba Corporation Semiconductor & Storage Products Company, JAPAN)
J. Suda (Kyoto University, JAPAN)

	Advanced Plasma Nanotechnology towards Green Innovation　Focused Session
	<Moderator> T. Nozaki (Tokyo Institute of Technology, JAPAN) <Panelist> M. Kambara (The University of Tokyo, JAPAN) M. Meyyappan (NASA Ames Research Center, USA) R. Nemanich (Arizona State University, USA) V. Svrcek (AIST, JAPAN)
* Listed in alphabetical order.