U. Czarnetzki(Ruhr-Universität Bochum, Germany)
J. G. Han(Sungkyunkwan University, Korea)
P.Chabert(LPP,CNRS,Ecole Polytechnique, France)
"Fundamentals of Low-Temperature Plasma Physics"
P. Favia(University of Bari, Italy)
"Tutorial Introduction to Plasma Processing of Biomedical Materials"
Y. Nanishi(Ritsumeikan University, Japan)
H. Sakakita(National Institute of Advanced Industrial Science and Technology, Japan)
Study on International Standardization of a Low Energy Ionized Gas Haemostasis Equipment
J.W. Bradley (University Liverpool, U.K)
"Plasma Discharges for the Ambient Processing of Materials"
W. H. Chiang(National Taiwan University of Science & Technology, Taiwan)
R. Dussart(University of Orléans, France)
S. Gortschakow(INP Greifswald, Germany)
"Advanced optical diagnostics for characterisation of switching and welding arcs"
J. L. He(Feng Chia University, Taiwan)
D. Rafalsky (Ecole Polytechnique, France)
"Plasma Sources of Bipolar Flows: Principles of Operation and Diagnostic Methods"
F. Tochikubo(Tokyo Metropolitan University, Japan)
J. P. Trelles (University of Massachusetts Lowell, U.S.A)
"Nonequilibrium Plasma Flows Simulation: Kinetics, Patterns, and Turbulence"
D. Feezell (The University of New Mexico, Mexico)
"High-speed Nonpolar and Semipolar Light-emitting Diodes for Visible Light Communication"
S. Keller (University of California, Santa Barbara, U.S.A)
"MOCVD of N-polar (Al,Ga,In)N heterostructures for Electronic Device Applications"
S. Krukowski (Unipress, Poland)
"Energy dissipation during adsorption at solid surfaces - the role of electron transfer"
X. L. Wang (National Institute of Advanced Industrial Science and Technology, Japan)
"Directional Micro LED based on Evanescent Wave Coupling"
N. Tansu(Lehigh University, U.S.A)
K. Yamamura (Osaka University, Japan)
"Highly Efficient Damage-free Chemical Mechanical Dry Finishing of Wide Gap Semiconductor Substrate by Plasma Assisted Polishing"
H. Chae (Sungkyunkwan University, Korea)
Y. C. Chou (National Chiao Tung University, Taiwan)
"Silicide and germanide formation in semiconductor nanowires(tentative)"
G. Dinescu (University of Bucharest, Romania)
K. Fukuzawa (Nagoya University, Japan)
K. Matsuda (Kyoto University, Japan)
"Studies of Optical Phenomena in Atomically Thin Two-dimensional Material and its Heterostructure for Novel Application"
K. Nagashio (The University of Tokyo, Japan)
"Understanding of Layered Heterointerfaces in 2D Semiconductors"
T. C. Wei(Chung Yuan Cristian University, Taiwan)
L. Yu (Nanjing University, China)
H. Kano (University of Tsukuba, Japan)
J.F. Kolb (University Rostock, Germany)
E. Martines (Consorzio RFX, Italy)
"Interacting with Cellular Processes using a Helium Plasma"
M. Nagatsu (Shizuoka University, Japan)
Y. Nakatsu (Kyushu University, Japan)
K. Nakazato (Nagoya Univeristy, Japan)
T. Nozaki (Tokyo Institute of Technology, Japan)
"Nonthermal plasma-assisted catalysis of greenhouse gas"
M. Shiratani (Kyushu Univeristy, Japan)
"Nanomaterial enhanced solar cells"
T. Sugaya (National Institute of Advanced Industrial Science and Technology, Japan)
"Smart stacked heterogeneous multijunction solar cells fabricated by advanced bonding using metal "
C. H. Wang (National Taiwan University of Science & Technology, Taiwan)
S. Chowdhury (UC Davis, U.S.A)
"Vertical GaN transistors for Power switching application"
R. A. Ferreyra (Kyoto Institute of Technology, Japan)
K. Nojiri (Lam Research Corp., Japan)
"Atomic layer etching of GaN and AlGan using directional plasma-enhanced approach"
H. Watanabe (Osaka University, Japan)
"Gate Stack Technology for Advanced GaN-based MOS Devices"
ISPlasma2018 / IC-PLANTS2018 Secretariat
Inter Group Corp.
Orchid Building 8F, 2-38-2, Meieki, Nakamura-ku, Nagoya, 450-0002 JAPAN
JJAP Special Issue Submission